The global 248nm Photoresist market size is predicted to grow from US$ million in 2025 to US$ million in 2031; it is expected to grow at a CAGR of %from 2025 to 2031.

248nm Photoresist is a photosensitive material used in a variety of processes to create patterned coatings on surfaces.

United States market for 248nm Photoresist is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

China market for 248nm Photoresist is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

Europe market for 248nm Photoresist is estimated to increase from US$ million in 2024 to US$ million by 2031, at a CAGR of % from 2025 through 2031.

Global key 248nm Photoresist players cover Fujifilm, DuPont, Noel Technologies, Inc., Tokyo Ohka Kogyo America, Inc., JSR, etc. In terms of revenue, the global two largest companies occupied for a share nearly % in 2024.

Infinity Market Research newest research report, the 248nm Photoresist Industry Forecast looks at past sales and reviews total world 248nm Photoresist sales in 2024, providing a comprehensive analysis by region and market sector of projected 248nm Photoresist sales for 2025 through 2031. With 248nm Photoresist sales broken down by region, market sector and sub-sector, this report provides a detailed analysis in US$ millions of the world 248nm Photoresist industry.

This Insight Report provides a comprehensive analysis of the global 248nm Photoresist landscape and highlights key trends related to product segmentation, company formation, revenue, and market share, latest development, and M&A activity. This report also analyzes the strategies of leading global companies with a focus on 248nm Photoresist portfolios and capabilities, market entry strategies, market positions, and geographic footprints, to better understand these firms unique position in an accelerating global 248nm Photoresist market.

This Insight Report evaluates the key market trends, drivers, and affecting factors shaping the global outlook for 248nm Photoresist and breaks down the forecast by Type, by Application, geography, and market size to highlight emerging pockets of opportunity. With a transparent methodology based on hundreds of bottom-up qualitative and quantitative market inputs, this study forecast offers a highly nuanced view of the current state and future trajectory in the global 248nm Photoresist.

This report presents a comprehensive overview, market shares, and growth opportunities of 248nm Photoresist market by product type, application, key manufacturers and key regions and countries.

Segmentation by Type:

    DUV Photoresist
    Others

Segmentation by Application:

    Silicon Wafer
    Compound Semiconductor
    Oxide Semiconductor
    Others

This report also splits the market by region:

    Americas
        United States
        Canada
        Mexico
        Brazil
    APAC
        China
        Japan
        Korea
        Southeast Asia
        India
        Australia
    Europe
        Germany
        France
        UK
        Italy
        Russia
    Middle East & Africa
        Egypt
        South Africa
        Israel
        Turkey
        GCC Countries

The below companies that are profiled have been selected based on inputs gathered from primary experts and analysing the companys coverage, product portfolio, its market penetration.

    Fujifilm
    DuPont
    Noel Technologies, Inc.
    Tokyo Ohka Kogyo America, Inc.
    JSR
    Kempur Microelectronics Inc.

Key Questions Addressed in this Report

What is the 10-year outlook for the global 248nm Photoresist market?
What factors are driving 248nm Photoresist market growth, globally and by region?
Which technologies are poised for the fastest growth by market and region?
How do 248nm Photoresist market opportunities vary by end market size?
How does 248nm Photoresist break out by Type, by Application?